Promoting Effects of Chromium on Ni/ MgO Catalysts for CNTs Synthesis by Chemical Vapor Deposition Method 助剂铬对Ni/MgO催化剂CVD法制备碳纳米管的促进作用
In the present thesis, several ZnO quasi-one-dimensional nanomaterials with novel morphologies were fabricated by chemical vapor deposition method. 准一维纳米材料是目前纳米材料研究中最活跃的领域之一。
Synthesis of Carbon Nanotubes Array by Chemical Vapor Deposition Method 化学气相沉积法合成纳米碳管阵列研究
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate. 为快速沉积高品质金刚石膜,建立了热阴极等离子体化学气相沉积方法。
Carbon nanotubes filled with metal were synthesized through chemical vapor deposition method, and the structure were studied by electron microscopy. 本文系统介绍了金属填充碳纳米管的化学气相沉积制备与电子显微学研究。
The glass composite thin films were deposited on silicon substrates by plasma enhanced chemical vapor deposition method ( PECVD). 本实验利用电浆辅助化学气相沉积法,在矽基材上沉积碳化矽玻璃。
Ti/ HMS Catalysts Prepared by the Chemical Vapor Deposition Method and Modified by Methyl-grafting 化学气相沉积法制备Ti/HMS催化剂及甲基接枝改性
Electro-catalytic behavior of boron-doped diamond films electrode prepared using hot filament chemical vapor deposition method 热丝化学气相沉积制备BDD薄膜电极的电催化特性
Nano-sized silicon films with large area were prepared by normal Low Pressure Chemical Vapor Deposition method. 利用普通低压化学气相沉积技术在玻璃衬底上制备了大面积的纳米硅薄膜。
Preparation of In_2O_3 nanowires by single-source chemical vapor deposition method 单源化学气相沉积法制备In2O3纳米线
The chemical vapor deposition method of producing electrothermal film of tin dioxide 化学汽相沉积制作氧化锡电热薄膜研究
Aligned multi-walled carbon nanotubes and nanofiber films were grown in quartz tube reactor by an injection chemical vapor deposition method. 采用注入化学蒸气沉积法,在石英管壁上制备得到了定向的多壁纳米碳管和纳米碳纤维。
Chemical equilibrium computation for preparation of Si 3N 4 by radio frequency plasma chemical vapor deposition method 高频等离子体化学气相淀积制备氮化硅超细粒子高频等离子体化学气相沉积法制氮化硅的化学平衡计算
Preparation of sno_2: sb films on sio_2-coated soda-lime glass by chemical vapor deposition method 镀SiO2膜玻璃基片上化学气相沉积法制备SnO2:Sb薄膜
Thick diamond films have been deposited by Electron Assisted Hot Filament Chemical Vapor Deposition Method. 研究了电子辅助热灯丝法生长金刚石厚膜过程中氢气流量对沉积速度和膜品质的影响。
Structure and properties of Sb-doped SnO_2 films prepared by chemical vapor deposition method CVD法制备Sb掺杂SnO2薄膜的结构与性能研究
A microwave plasma chemical vapor deposition method was used to deposit a-Si: H films at high rate. 本文报道了用微波等离子体化学气相淀积(MP&CVD)技术从SiH4+H(?)进行a-Si∶H薄膜的高速淀积研究。
Diamond film was coated by the hot filament chemical vapor deposition method. 在热丝化学气相沉积装置中,制备金刚石薄膜。
Effect of Carrying Gas on Preparation of Carbon Nanotubes and Nanofibers by an Injection Chemical Vapor Deposition Method 载气对注入CVD法制备碳纳米管和碳纳米纤维的影响
K, was prepared on MgO ( 111) substrates by the chemical vapor deposition method. 测试样品是利用化学气相沉积技术在MgO(111)基片上制备的c轴织构的MgB2超导薄膜,薄膜的超导转变温度和转变宽度分别为38K和0.1K。
The laser induced chemical vapor deposition method with double beam optical stimulation is a preferable way to synthesize silicon nitride nano-powder of high purity. 采用双光束激励的激光诱导化学气相沉积法是制备高纯度纳米氮化硅粉体的理想方法。
Antimony-doped tin oxide ( ATO) films were deposited on SiO2 coated soda-lime glass substrates by the chemical vapor deposition method. 采用化学气相沉积法在镀有SiO2膜的钠钙硅玻璃基片上制备了Sb掺杂SnO2(antimony-dopedTinOxide,ATO)薄膜。
Microwave plasma chemical vapor deposition ( MPCVD), a kind of chemical vapor deposition method with low temperature, low intensity of pressure and clearance, is commonly used for the growth of diamond thin films. 微波等离子体增强化学气相沉积法(MPCVD法)是众多低气压下激活CVD工艺方法的一种,也是目前在国内外比较流行的制备金刚石薄膜的工艺方法之一。
Modification of Pore Diameter and Adsorption Properties of 13X Molecular Sieve Treated by Chemical Vapor Deposition Method 化学气相沉积法对13X分子筛孔径修饰及吸附性能研究
Diamond-like carbon films could be fabricated by plasma enhanced chemical vapor deposition method too, the surface morphology of the films was good, but the films had very big internal stress, which could be decreased by adding proper nitrogen gas in work chamber. 用等离子体增强化学气象沉积技术也能制备类金刚石膜。优点是用这种方法制备的薄膜表面形貌得到了一定的改善,但内应力较大,通过加入适量的氮气可以改善一些。
Graphene films were synthesized by using microwave chemical vapor deposition method in this paper. 本文利用微波等离子体化学气相沉积方法制备了石墨烯薄膜。
The results also confirmed ZnO films optoelectronic device can be prepared by the simple chemical vapor deposition method. 这个结果证实了ZnO薄膜的发光器件也可以通过简单的化学气相沉积方法实现。